ST0043 N-type Silicon Sputtering Target (N-doped Si)

N-type Silicon Sputtering Target Description

N-type silicon sputtering target is dark gray with a bluish tinge. Silicon is a chemical element that originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation was later accomplished and announced by J. Berzelius. “Si” is the canonical chemical symbol of silicon. Its atomic number in the periodic table of elements is 14 with a location at Period 3 and Group 14, belonging to the p-block. The relative atomic mass of silicon is 28.0855(3) Dalton, the number in the brackets indicating the uncertainty.

N-type Silicon Sputtering Target Specification

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

N-type Silicon Sputtering Target Bonding Services

Indium Bonding is available for N-type silicon sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

N-type Silicon Sputtering Target Application

The N-type silicon sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Other applications of silicon are:

• Solar cells
• Transistors
• Semiconductors
• Rectifiers and other solid-state devices that are used widely in the electronics and space sectors.

N-type Silicon Sputtering Target Packaging

Our N-type silicon sputter coater target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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SAM’s N-type silicon sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.