ST0013 Erbium Sputtering Target, Er

Erbium Sputtering Target Description

The erbium sputtering target is composed of high purity erbium metal. Erbium is a chemical element that originated from Ytterby, Sweden. It was first mentioned in 1842 and observed by G. Mosander. “Er” is the canonical chemical symbol of erbium. Its atomic number in the periodic table of elements is 68 with a location at Period 6 and Group 3, belonging to the f-block. The relative atomic mass of erbium is 167.259(3) Dalton, the number in the brackets indicating the uncertainty.

Read more: Erbium Rare Earth Element: Introduction, Properties, and Applications

Erbium Sputtering Target Specification

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Erbium Sputtering Target Application

• Erbium sputtering target is used for thin film deposition.
• Erbium is used in metallurgical and nuclear sectors. Add Erbium to Vanadium, it reduces the hardness and enhances the workability.
• Pure Erbium is utilized as an alloying element with titanium. It is even used for making infrared absorbing glass.
• In the ceramics sector, erbium oxide is used for creating a pink glaze.
• Erbium salt has an attractive pastel color and has been utilized as a colorant in, for example, porcelain enamel glazes and glasses.

Handling Notes

1. No bonding service is presently available for the erbium sputtering target. 2. This material has high chemical activity when exposed to the environment. Oil packaging and clean procedure are required to prevent it from chemical reactions.

Packaging

The erbium sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM’s erbium sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film deposition materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of sputtering targets and other deposition materials that are not listed.