ST0011 Copper Sputtering Target, Cu

Product Overview

Copper, with its chemical symbol Cu, is a highly versatile element widely utilized in various industries due to its excellent electrical and thermal conductivity, corrosion resistance, and malleability. Our Copper Sputtering Targets, crafted from high-purity copper, embody these inherent properties, making them ideal for a broad range of deposition applications.

Key Features

• Material Type: Pure Copper (Cu)
• Color/Appearance: Metallic, Copper
• Melting Point: 1,083°C
• Density: 8.96 g/cm³
• Sputter: DC
• Bonding Types Available: Indium, Elastomer
• Available Sizes: Diameters from 2.0″ to 6.0″, Thicknesses from 0.125″ to 0.250″

Advanced Specifications

• Purity Levels: High purity copper starting at 99.99%, ensuring superior performance in your sputtering processes.
• Customization: We offer customized shapes and sizes to meet the specific needs of your applications. Contact us to discuss your requirements.

Applications

Copper sputtering targets are essential in various high-tech applications:

• Semiconductor Manufacturing: Used in the production of semiconductors where high-purity copper is crucial for the fabrication of reliable, efficient devices.
• Thin Film Deposition: Ideal for creating conductive layers in thin-film transistors (TFTs) used in large-format, high-resolution displays.
• Photovoltaic Devices: Copper targets are used in the deposition processes for solar cells, enhancing their efficiency and performance.
• Optical Storage Media: Essential for the production of recording layers in CD-ROMs and other optical storage devices.

Planar and Rotary Targets

• Planar Targets: Our planar copper targets feature high density and uniform grain structures, providing consistent performance and long target life.
• Rotary Targets: Designed for high utilization rates, our rotatory copper targets reduce material waste and increase the efficiency of your sputtering operations.

Bonding and Backing Services

We offer comprehensive target bonding and backing services to ensure our copper targets meet your exact requirements:

• Indium Bonding: Provides a strong bond with excellent thermal conductivity.
• Elastomeric Bonding: Offers flexibility and robust bonding for delicate applications.

Quality Assurance and Packaging

Our copper sputtering targets are rigorously tested and certified to meet stringent quality standards. Each target is clearly labeled and securely packaged to ensure they reach you in perfect condition, ready for immediate use in your sputtering systems.

Frequently Asked Questions (FAQs)

Q1: What advantages does copper offer as a sputtering material?
A1: Copper provides excellent thermal and electrical conductivity, essential for creating uniform, conductive coatings in semiconductor and display manufacturing.

Q2: Can you provide copper sputtering targets in custom dimensions?
A2: Yes, we can manufacture copper targets in various dimensions and thicknesses tailored to your specific requirements.

Q3: What bonding services do you offer for copper targets?
A3: We provide both indium and elastomeric bonding services, depending on your needs and the specific applications of the targets.

Q4: How do you ensure the quality of your copper sputtering targets?
A4: We employ strict quality control measures throughout the manufacturing process, ensuring each target meets our high standards of purity and integrity.

Q5: What types of copper sputtering targets do you offer?
A5: We offer both planar and rotary copper sputtering targets, suitable for various sputtering systems and applications.

Contact Us

For more information, and pricing details, or to discuss your specific needs for Copper Sputtering Targets, please contact us. Our team of experts is ready to provide you with solutions that enhance your sputtering applications.

Related Article: Copper Sputter Target: An Excellent Sputtering Material