ST0003 Barium Sputtering Target, Ba

Barium Sputtering Target Description

Barium sputtering target is made of high purity Barium metal. Barium is the fifth element in group 2 and is a soft, silvery alkaline earth metal. Because of its high chemical reactivity, barium is never found in nature as a free element. Its hydroxide, known in pre-modern times as baryta, does not occur as a mineral, but can be prepared by heating barium carbonate. The most common naturally occurring minerals of barium are barite (barium sulfate, BaSO4) and witherite (barium carbonate, BaCO3), both insoluble in water. The name barium originates from the alchemical derivative “baryta”, from Greek βαρύς (barys), meaning “heavy.”

Barium Sputtering Target Specifications

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Barium Sputtering Target Application

Barium sputtering targets are used to deposit barium thin films, which are used as a lubricant on the rotors of anodes in vacuum X ray tubes. The most important barium compounds are the carbonate, the nitrate, the oxide and the sulfate. Barium carbonate is used in chemical applications, in the treatment of salt brines to remove some sulfate, as flux in ceramics and as an ingredient in optical glass and fine glassware. Barium nitrate (Ba(NO3)2) is used to produce a green color in flares, pyrotechnic devices and tracer bullets. Barium oxide is used in the manufacture of lubricating oil detergents. Barium sulfate as a paint pigment and in cosmetics. A small but vital use is in X-ray photography of the gastrointestinal tract where it provides a fine opaque contrasting medium ingested prior to X-ray examination.

Barium Sputtering Target Packing

Barium sputtering targets from Stanford Advanced Materials are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM’s barium sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film deposition materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.