Chemical Formula: ZrO2
Catalog Number: ST0206
CAS Number: 1314-23-4
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Zirconium oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) provides a wide range of film coating materials with competitive price and great delivery time.
Zirconium Oxide Sputtering Target Safety Data Sheet
Zirconium oxide sputtering target from Stanford Advanced Materials contains Zr and O. Zirconium dioxide sputtering target, sometimes known as zirconia sputter target, is a white crystalline oxide of zirconium. The most naturally occurring form of ZrO2, with a monoclinic crystalline structure, is the mineral baddeleyite. A dopant stabilized cubic structured zirconia, cubic zirconia, is synthesized in various colors for use as a gemstone and a diamond simulant.
Three phases of ZrO2 are known: monoclinic below 1170 °C, tetragonal between 1170 °C and 2370 °C, and cubic above 2370 °C. The trend is for higher symmetry at higher temperatures, as is usually the case. A small percentage of the oxides of calcium or yttrium stabilize in the cubic phase. The very rare mineral tazheranite, (Zr, Ti, Ca)O2, is cubic. Unlike TiO2, which features six-coordinated titanium in all phases, monoclinic zirconia consists of seven-coordinated zirconium centers. This difference is attributed to the larger size of the zirconium atom relative to the titanium atom.
| Material Type | Zirconium Oxide |
| Symbol | ZrO2 |
| Color/Appearance | White, Solid |
| Melting Point (°C) | ~2,700 |
| heoretical Density (g/cc) | 5.89 |
| Sputter | RF, RF-R |
| Type of Bond | Indium, Elastomer |
| Comments | Films oxygen deficient, clear and hard. |
The main use of zirconia is in the production of hard ceramics, such as in dentistry, with other uses including as a protective coating on particles of titanium dioxide pigments, as a refractory material, as a thin film coating material, in insulation, fuel cell, abrasives and enamels. Zirconia sputtering target is used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc.
Stabilized zirconia is used in oxygen sensors and fuel cell membranes because it has the ability to allow oxygen ions to move freely through the crystal structure at high temperatures. This high ionic conductivity (and a low electronic conductivity) makes it one of the most useful electroceramics. Zirconium dioxide is also used as the solid electrolyte in electrochromic devices. Zirconia is a precursor to the electroceramic lead zirconate titanate (PZT), which is a high-K dielectric, which is found in myriad components.
Indium Bonding and Elastomeric Target Bonding Service are available for the zirconium oxide ZrO2 sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our zirconium oxide sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High purity zirconium oxide sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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