Chemical Formula: ZnO/Al2O3
Catalog Number: ST0204
CAS Number: 1314-13-2 | 1344
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The zinc oxide with alumina sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality zinc oxide with alumina sputter targets at the most competitive prices.
Zinc Oxide with Alumina MSDS File
Zinc Oxide with Alumina sputtering target from Stanford Advanced Materials is an oxide sputtering material with the formula ZnO/Al2O3.
Zinc is a chemical element that originated from the German, ‘zinc’, which may, in turn, be derived from the Persian word ‘sing’, meaning stone. It was early used before 1000 BC and discovered by Indian metallurgists. “Zn” is the canonical chemical symbol of zinc. Its atomic number in the periodic table of elements is 30 with a location at Period 4 and Group 12, belonging to the d-block. The relative atomic mass of zinc is 65.409(4) Dalton, the number in the brackets indicating the uncertainty.
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Aluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaning bitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.
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Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Oxide Ceramic Sputtering Target
Indium Bonding and Elastomeric Target Bonding Service are available for Zinc Oxide with Alumina sputtering target. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our Zinc Oxide with Alumina Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
We specialize in producing high purity Zinc Oxide with Alumina Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
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