Chemical Formula: Ti0.44Si0.10O
Catalog Number: ST0474
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Titanium Silicate Sputtering Targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.
Titanium Silicate Sputtering Target is composed of titanium, silicon, and oxygen. High-purity titanium silicate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Related products: Titanium Sputtering Target, Silicon Sputtering Target, Oxide Ceramic Sputtering Target
| Material Type | Titanium Silicate |
| Symbol | Ti0.44Si0.10O |
| Color/Appearance | Solid |
| Melting Point | / |
| Density | / |
| Type of Bond | Elastomer, Indium |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Titanium Silicate Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our Titanium Silicate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
We specialize in producing high purity Titanium Silicate Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
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