Chemical Formula: SnO2
Catalog Number: ST0194
CAS Number: 18282-10-5
Purity: >99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The tin oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality tin oxide sputter targets at the most competitive prices.
Tin oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material containing Sn and O.
Tin, also called stannum, is a chemical element that originated from the Anglo-Saxon word tin (stannum in Latin, meaning hard). It was early used in 3500 BC. “Sn” is the canonical chemical symbol of tin. Its atomic number in the periodic table of elements is 50 with a location at Period 5 and Group 14, belonging to the p-block. The relative atomic mass of tin is 118.710(7) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Tin Sputtering Target
Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Oxide Ceramic Sputtering Target
| Compound Formula | SnO2 |
|---|---|
| Molecular Weight | 150.69 |
| Appearance | White to gray solid |
| Melting Point | 1630 °C |
| Density | 6.95 g/cm3 |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
1. Elastomer bonding is recommended for this material, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.
Our tin oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High-quality tin oxide sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.
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Met our needs. Arrived in a timely manner well packed. Would buy again.
