Chemical Formula: Tb4O7
Catalog Number: ST0192
CAS Number: 12036-41-8
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The terbium oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality terbium oxide sputter targets at the most competitive prices.
Terbium oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material containing Tb and O.
Terbium is a chemical element originated from Ytterby, Sweden. It was first mentioned in 1842 and observed by G. Mosander. The isolation was later accomplished and announced by G. Mosander. “Tb” is the canonical chemical symbol of terbium. Its atomic number in the periodic table of elements is 65 with location at Period 6 and Group 3, belonging to the f-block. The relative atomic mass of terbium is 158.92535(2) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Terbium Sputtering Target
Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Oxide Ceramic Sputtering Target
| Material Type | Terbium Oxide |
| Symbol | Tb4O7 |
| Color/Appearance | Brown |
| Melting Point (°C) | Decomposes to Tb2O3 |
| Density | 7900 kg/m-3 |
| Molecular Weight | 747.69 |
| Exact Mass | 174.92 g/mol |
Our Tb4O7 Terbium Oxide Sputtering Target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM specializes in producing high purity Terbium Oxide Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.
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