(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0471 Strontium Niobium Titanate Sputtering Target

Chemical Formula: SrNb(1-x)TixO3
Catalog Number: ST0471
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Strontium Niobium Titanate Sputtering Targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.




Description

Strontium Niobium Titanate Sputtering Target Description

Strontium Niobium Titanate Sputtering Target is composed of strontium, niobium, titanium, and oxygen. High-purity strontium niobium titanate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.

Related products: Strontium Sputtering TargetNiobium Sputtering TargetTitanium Sputtering TargetOxide Ceramic Sputtering Target

Strontium Niobium Titanate Sputtering Target Specification

Material Type Strontium Niobium Titanate
Symbol SrNb(1-x)TixO3
Color/Appearance Solid
Melting Point /
Density /
Type of Bond Elastomer, Indium
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Other sizes are also available. Please contact us for customized sputtering targets.

Strontium Niobium Titanate Sputtering Target Application

Strontium Niobium Titanate Sputter Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Strontium Niobium Titanate Sputtering Target Packaging

Our Strontium Niobium Titanate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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We specialize in producing high purity Strontium Niobium Titanate Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

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Strontium Niobium Titanate Sputtering Target
Average rating:  
 1 reviews
by Mark Freidline on Strontium Niobium Titanate Sputtering Target

Super fast shipping. Items came exactly as described and at a great price.