Chemical Formula: Nd2O3
Catalog Number: ST0178
CAS Number: 1313-97-9
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Stanford Advanced Materials (SAM) provides a wide range of neodymium oxide sputtering target products with competitive price and great delivery time. Customized forms are available upon request.
Neodymium oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material containing Nd and O.
Neodymium is a chemical element that originated from the Greek ‘neos didymos’ meaning new twin. It was first mentioned in 1885 and observed by A. von Welsbach. “Nd” is the canonical chemical symbol of neodymium. Its atomic number in the periodic table of elements is 60 with a location at Period 6 and Group 3, belonging to the f-block. The relative atomic mass of neodymium is 144.242(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Neodymium Sputtering Target
Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.
| Material Type | Neodymium Oxide |
| Symbol | Nd2O3 |
| Color/Appearance | Light blue, Solid |
| Melting Point (°C) | 2,272 |
| Sputter | RF, RF-R, DC |
| Type of Bond | Indium, Elastomer |
Indium Bonding and Elastomeric Target Bonding Service are available for neodymium oxide sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our neodymium oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM specializes in producing high purity neodymium oxide sputtering target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
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