Chemical Formula: MgO
Catalog Number: ST0175
CAS Number: 1309-48-4
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
At Stanford Advanced Materials, we have extensive experience in providing the highest-quality magnesium oxide sputtering targets available on the market. We take pride in our ability to customize target shapes to meet your specific requirements or drawings, ensuring that your application is optimized for success.
Our magnesium oxide sputtering target is a high-quality oxide sputtering material that contains a precise amount of magnesium and oxygen. It is primarily used in applications such as thin film deposition, electronic and semiconductor industry, optical coatings, and magnetic storage media. Magnesium oxide sputtering targets are made by casting pure magnesium and oxygen in a vacuum environment, resulting in a dense and uniform material structure with excellent mechanical properties and chemical stability.
Related Product: Magnesium Sputtering Target, Oxide Ceramic Sputtering Target
| Material Type | Magnesium Oxide |
| Symbol | MgO |
| Color/Appearance | White, Crystalline Solid |
| Melting Point | 2,852 °C |
| Density | 3.58 g/cm³ |
| Sputter | RF |
| Type of Bond | Indium bonding |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
1. Indium Bonding is recommended for magnesium oxide sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.
2. This material has a low thermal conductivity are susceptible to thermal shock.
Our magnesium oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
At Stanford Advanced Materials, we offer magnesium oxide sputtering targets in a range of forms, purities, sizes, and prices. We specialize in high-purity film coating materials that have the highest density and smallest average grain sizes, perfect for use in various applications such as semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) displays and optics. Our rigorous quality control process ensures that you receive the highest quality product from production to delivery. Contact us today to learn more about our magnesium oxide sputtering targets and how they can benefit your specific application. Submit your inquiry now to get started.
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I bought 3 pieces 2.00″ Dia. x 0.125″ Thick MgO sputter target for my lab. They worked well for my sputtering experiment.
