Chemical Formula: PbZr0.52Ti0.48O3
Catalog Number: ST0451
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Lead zirconate titanate with niobium sputtering targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.
The lead zirconate titanate with niobium sputtering target is composed of lead, zirconium, titanium, niobium and oxygen. High-purity lead zirconate titanate with niobium sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Related products: Lead Sputtering Target, Zirconium Sputtering Target, Titanium Sputtering Target, Niobium Sputtering Target, Oxide Ceramic Sputtering Target
Material Type | Lead Zirconate Titanate With Niobium |
Symbol | PbZr 0.52Ti 0.48O3 |
Color/Appearance | Solid |
Melting Point | N/A |
Density | N/A |
Type of Bond | Elastomer, Indium |
Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
Other sizes are also available. Please contact us for customized sputtering targets.
The lead zirconate titanate with niobium sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our lead zirconate titanate with niobium sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
We specialize in producing high-purity lead zirconate titanate with niobium sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
Submit your review | |
1 2 3 4 5 | |
Submit Cancel |
Arrived as stated. Are just what I need to use with my sputtering machine.