Chemical Formula: LaNiO3
Catalog Number: ST0161
CAS Number: 12031-18-4
Purity: >99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The lanthanum nickel oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality lanthanum nickel oxide sputter targets at the most competitive prices.
Lanthanum nickel oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material containing La, Ni and O.
Lanthanum, a soft, malleable, silvery-white white metal, is one of the most reactive rare earth elements. It can be utilized to make special optical glasses and can also be utilized to make steel more malleable. In addition, lanthanum is helpful in wastewater treatment and oil refining. Scientists have given the name of “super calcium” to Lanthanum due to its application of photoconversion film.
Related Product: Lanthanum Sputtering Target
Nickel is a chemical element that originated from the shortened of the German ‘kupfernickel’ meaning either devil’s copper or St. Nicholas’s copper. It was first mentioned in 1751 and observed by F. Cronstedt. The isolation was later accomplished and announced by F. Cronstedt. “Ni” is the canonical chemical symbol of nickel. Its atomic number in the periodic table of elements is 28 with a location at Period 4 and Group 10, belonging to the d-block. The relative atomic mass of nickel is 58.6934(2) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Nickel Sputtering Target
Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Oxide Ceramic Sputtering Target
1. Indium Bonding is recommended for lanthanum nickel oxide sputtering target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity are susceptible to thermal shock.
The lanthanum nickel oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our lanthanum nickel oxide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High-quality lanthanum nickel oxide sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.
Submit your review | |
I've been using LaNiO3 sputtering targets for my thin film research, and I'm impressed with the uniformity and quality of the films I've been able to produce. The target's consistency really makes a difference in repeatability across my experiments.
