Chemical Formula: La2CuO4
Catalog Number: ST0443
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Lanthanum copper oxide sputtering targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.
Lanthanum copper oxide sputtering target is composed of lanthanum, copper, and oxygen with the chemical formula La2CuO4. High-purity lanthanum copper oxide sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Related products: Lanthanum Sputtering Target, Copper Sputtering Target, Oxide Ceramic Sputtering Target
| Material Type | Lanthanum Copper Oxide |
| Symbol | La2CuO4 |
| Color/Appearance | Solid |
| Melting Point | N/A |
| Density | 6.93 ~ 7.08 g/cm3 |
| Type of Bond | Elastomer, Indium |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
Other sizes are also available. Please contact us for customized sputtering targets.
The lanthanum copper oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Target Bonding Service is available for lanthanum copper oxide sputtering targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.
Our lanthanum copper oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
We specialize in producing high-purity lanthanum copper oxide sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
Submit your review | |
As a PhD student working on novel oxide materials for energy applications, I found the Lanthanum Copper Oxide sputtering target to be exceptionally reliable for creating thin films with the precise stoichiometry needed for my research. The consistency of the target material has been vital for the reproducibility of my results.
These are exactly as described. I got them for sputter coating experiment and they're ideal for that purpose.
