Chemical Formula: La2CuMnO6
Catalog Number: ST0442
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Lanthanum copper manganate sputtering targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.
Lanthanum copper manganate sputtering target is composed of lanthanum, copper, manganese and oxygen with the chemical formula La2CuMnO6. High-purity lanthanum copper manganate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Related products: Lanthanum Sputtering Target, Copper Sputtering Target, Manganese Sputtering Target, Oxide Ceramic Sputtering Target
| Material Type | Lanthanum Copper Manganate |
| Symbol | La2CuMnO6 |
| Color/Appearance | Solid |
| Melting Point | N/A |
| Density | N/A |
| Type of Bond | Elastomer, Indium |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
Other sizes are also available. Please contact us for customized sputtering targets.
The lanthanum copper manganate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our lanthanum copper manganate sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s lanthanum copper manganate sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
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Impressed with these so far. Used with sophomore students in a lab experiment that went extremely well!
