ST0419 Iridium Oxide Sputtering Target, IrO2

Iridium Oxide Sputtering Target Description

Iridium oxide sputtering target from Stanford Advanced Materials contains Ir and O. Iridium oxide is a blue-black solid. IrO2 is the only well-characterized oxide of iridium. The structure of IrO2 is similar to the TiO₂ rutile structure, featuring six-coordinate iridium and three-coordinate oxygen. There are several different methods for obtaining iridium oxide, which can be divided into two categories: modification and reactive deposition.

Related Product: Iridium Sputtering Target

Iridium is a rare, hard, lustrous, brittle, very dense platinum-like metal. Chemically it is almost as unreactive as gold. It is the most corrosion-resistant metal known and it resists attack by any acid. Iridium is generally credited with being the second densest element (after osmium) based on measured density, although calculations involving the space lattices of the elements show that iridium is denser.

Iridium Oxide Sputtering Target Specification

Iridium Oxide Sputtering Target Applications

Iridium oxide sputtering target is used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc. IrO2 is also used with other rare oxides, such as titanium nitride or iridium oxide,  in the coating of anode-electrodes for industrial electrolysis and in microelectrodes for electrophysiology research.

Iridium Oxide Sputtering Target Bonding Services

Iridium oxide sputter targets can be bonded by Indium Bonding and Elastomeric Target Bonding Service. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

Packaging

IrO2 sputter coater target is carefully packaged in the plastic vacuum bag to prevent damage during storage and transportation and to preserve the quality of our products in their original condition. Also, the COA of the raw material would be packaged with the product.

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High purity Iridium oxide sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.