(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0439 Indium Iron Oxide Sputtering Target, InFe2O4

Chemical Formula: InFe2O4
Catalog Number: ST0439
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Indium iron oxide sputtering targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.




Description

Indium Iron Oxide Sputtering Target Description

Indium iron oxide sputtering target is composed of indium, iron and oxide with the chemical formula of InFe2O4. High-purity indium iron oxide sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.

Related products: Indium Sputtering TargetIron Sputtering Target, Oxide Ceramic Sputtering Target

IndiumironOxygen

Indium Iron Oxide Sputtering Target Specification

Material Type Indium Iron Oxide
Symbol InFe2O4
Color/Appearance Reddish Solid
Melting Point N/A
Density N/A
Type of Bond Elastomer, Indium
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Other sizes are also available. Please contact us for customized sputtering targets.

Indium Iron Oxide Sputtering Target Application

The indium iron oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Packaging of Indium Iron Oxide Sputtering Target

Our indium iron oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Get Contact

We specialize in producing high purity indium iron oxide sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

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Indium Iron Oxide Sputtering Target, InFe2O4
Average rating:  
 1 reviews
by Fred Bicha on Indium Iron Oxide Sputtering Target, InFe2O4

I bought these for chemistry class to do some film coating experiments with. They function properly for what we use them for.