Chemical Formula: EuNiO3
Catalog Number: ST0435
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Europium nickel oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.
Europium nickel oxide sputtering target is composed of rare earth europium, nickle and oxide with the chemical formula of EuNiO3. High-purity europium nickel oxide sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Related products: Europium Sputtering Target, Nickel Sputtering Target, Oxide Ceramic Sputtering Target
| Material Type | Europium Nickel Oxide |
| Symbol | EuNiO3 |
| Color/Appearance | Solid |
| Structure | N/A |
| Density | 7.57 g/cm3 |
| Type of Bond | Elastomer, Indium |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Our europium nickel oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
We specialize in producing high purity europium nickel oxide sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
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Bought these and donated them to the local Community College chemistry lab.
Hope they be happy when they are to receive these gift.
