Chemical Formula: Cr2O3
Catalog Number: ST0141
CAS Number: 1308-38-9
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Stanford Advanced Materials (SAM) provides the best chromium oxide sputtering target on the market with a competitive price and great delivery time. Customized forms are available upon request.
Chromium oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material with the formula Cr2O3.
Chromium is a chemical element that originated from the Greek ‘chroma’, meaning color. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with the location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.
It is widely used in the automobile industry to form a shiny coating found on wheels and bumpers. Chromium is used in many vacuum applications such as automotive glass coatings, photovoltaic cell fabrication, battery fabrication, and decorative and corrosion-resistant coatings.
Related Product: Chromium Sputtering Target
Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Oxide Ceramic Sputtering Target
| Material Type | Chromium Oxide |
| Symbol | Cr2O3 |
| Color/Appearance | Green, Crystalline Solid |
| Melting Point | 2,266℃ |
| Sputter | RF, RF-R |
| Type of Bond | Indium, Elastomer |
| Comments | Disproportionates to lower oxides; reoxidizes at 600°C in air. |
| Available Sizes | Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Target bonding service is recommended for this material, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc. Indium Bonding and Elastomeric Target Bonding Service are available for chromium oxide Cr2O3 sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our chromium oxide sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM specializes in producing high purity chromium oxide sputter target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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Worked great for the science project we did during the mid-exam. Thanks
So much high quality for such a cheap price. Came exactly as described and good quality.
