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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0218 Vanadium Nitride Sputtering Target, VN

Chemical Formula: VN
Catalog Number: ST0218
CAS Number: 24646-85-3
Purity: 99.5%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The vanadium nitride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality vanadium nitride sputter targets at the most competitive prices.

Vanadium Nitride MSDS File




Description

Vanadium Nitride Sputtering Target Description

Vanadium Nitride sputtering target from Stanford Advanced Materials is a nitride ceramic sputtering material with the formula VN.

Vanadium is a chemical element that originated from Vanadis, an old Norse name for the Scandinavian goddess Freyja. It was first mentioned in 1801 and observed by M. del Río. The isolation was later accomplished and announced by N.G.Sefström. “V” is the canonical chemical symbol of vanadium. Its atomic number in the periodic table of elements is 23 with a location at Period 4 and Group 5, belonging to the d-block. The relative atomic mass of vanadium is 50.9415(1) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Vanadium Sputtering Target

NitrogenNitrogen is a chemical element that originated from the Greek ‘nitron’ and ‘genes’ meaning nitre-forming. It was first mentioned in 1772 and observed by D. Rutherford. The isolation was later accomplished and announced by D. Rutherford. “N” is the canonical chemical symbol of nitrogen. Its atomic number in the periodic table of elements is 7 with a location at Period 2 and Group 15, belonging to the p-block. The relative atomic mass of nitrogen is 14.0067(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Nitride Ceramic Sputtering Target

Vanadium Nitride Sputtering Target Specification

Material Type Vanadium Nitride
Symbol VN
Color/Appearance Black
Density 6.13 g/cm3
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Vanadium Nitride Sputtering Target Application

The vanadium nitride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Vanadium Nitride Sputtering Target Packaging

Our vanadium nitride sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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High-quality vanadium nitride sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.