Chemical Formula: Si3N4
Catalog Number: ST0215
CAS Number: 12033-89-5
Purity: 99.5%, 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Silicon nitride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality silicon nitride sputter target at the most competitive price.
Silicon Nitride Sputtering Target Safety Data Sheet
Silicon nitride sputtering target is a type of nitride ceramic sputtering target. Si3N4 is a high-melting-point ceramic material that is extremely hard and relatively chemically inert. Si3N4 is prepared by heating powdered silicon between 1300 °C and 1400 °C in an atmosphere of nitrogen. Then the powder of silicon nitride can be sintered to the designed shape. Silicon nitride sputter target is used for thin film deposition.
| Material Type | Silicon Nitride |
| Symbol | Si3N4 |
| Color/Appearance | White to Gray or Dark Gray to Black, Crystalline Solid |
| Melting Point | 1,900 °C |
| Density | 2.2 to 3.5 g/cm3 |
| Sputter | RF, RF-R |
| Type of Bond | Indium, Elastomer |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Silicon nitride sputtering targets are used for CD-ROM, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Silicon nitride is one of the most thermodynamically stable technical ceramic material with high hardness as well, silicon nitride ceramic is ideal for bearing parts, especially for those required to work at high speed and high temperature. Silicon nitride has also been used in high-temperature applications, such as rocket engines. It was considered as one of the few monolithic ceramic materials that could survive the severe thermal shock and thermal gradients generated in hydrogen-oxygen rocket engines.
Indium bonding and Elastomer bonding are available for the silicon nitride sputtering materials. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our silicon nitride sputter targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High Quality silicon nitride sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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These Si3N4 targets are really nice. They're made from very good raw materials. They are really well-made.
These target sizes are well-tailored and perfectly fit my coater.
