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Sputtering Target
By Target Materials
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By Chemical Elements
Evaporation Materials
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By Chemical Elements
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Reclaim Service
Rotatory Targets
Planar Targets
Evaporation Sources
Thermal sources
E-Beam Source Used Crucibles
3D Printing Powder
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Sputtering Target
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By Chemical Elements
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ST0902 Cobalt Chromium Iron Nickel Manganese High-Entropy Alloy (HEA) Sputtering Target, Co/Cr/Fe/Ni/Mn
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ST0903 Cobalt Nickel Vanadium High-Entropy Alloy (HEA) Sputtering Target, Co/Ni/V
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ST0912 Inconel 600 Sputtering Targets, Ni/Cr/Fe
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ST0914 Lithium Nickel Oxide Sputtering Target, LiNiO2
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ST0917 Stainless Steel Sputtering Target
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ST0941 Nickel Antimonide Sputtering Target, NiSb
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ST0975 Copper Manganese Nickel Sputtering Target, CuMnNi
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ST0997 Nickel Gallium Sputtering Target, Ni/Ga
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ST0998 Nickel Cobalt Sputtering Target, Ni-Co
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ST0999 Nickel Iron Sputtering Target, Ni-Fe
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ST1000 Nickel Sulfide Sputtering Target, NiS
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ST1002 Samarium Nickel Oxide Sputtering Target, SmNiO3
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Sputtering Target
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Featured Products
ST1013 Barium Strontium Titanate Sputtering Target, BaxSr(1-x)TiO3
ST1012 Barium Carbonate Sputtering Target, BaCO3
ST1011 Chromium Silicide Sputtering Target, Cr3Si
ST1010 Manganese Oxide Sputtering Target, Mn2O3
ST1009 Cadmium Zinc Sulfide Sputtering Target, ZnS-CdS