| Catalog No. | MG2274 |
|---|---|
| Material | MgO |
| Clear Aperture | >95 % |
| Thickness/Diameter Tolerance | ±0.05 mm |
Stanford Advanced Materials (SAM) provides magnesium oxide wafer substrate in diameter from 2″ to 12″. We always choose prime grade and defect-free wafer as a substrate for growing high uniformity thermal oxide layer to meet your specific requirements.
MgO wafer can be fabricated in round or square shape, with a SEMI flat or without flat, one side polished or two sides polished, size from 10 x10 mm to 2 “, thickness range from 0.4, 0.5, 1 to 2 mm, surface are epi polished with low surface roughness. We have twin free and defect-free magnesium oxide wafer substrates with various orientation <100>, <110> and <111>, and high precision surface finish, please contact us for more product information.
|
Materials |
MgO |
|
Orientation |
<100> / <111> / <110> or others |
|
Parallel |
10″ |
|
Perpendicular |
5′ |
|
Surface quality |
10/5 |
|
Wavefront Distortion |
λ/4@632 nm |
|
Surface flatness |
λ/8@632 nm |
|
Clear Aperture |
>95 % |
|
Chamfer |
<0.1×45° |
|
Thickness/Diameter Tolerance |
±0.05 mm |
|
Maximum dimensions |
dia 50×100 mm |
Magnesium oxide wafer substrate products are used widely for HTSC (high-temperature superconductor) thin film coatings applications worldwide. There is also a growing amount of interest in using these substrates, because of their economic cost, for other applications that previously would not have justified the higher cost of MgO, such as for use as substrates for the III to V elements.
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