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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

Industry News

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. We update every week about news and knowledge of sputtering targets and evaporation materials. Here are the industrial news we published previously, if you want to see all the news, please click here.

thin film solar cell
06
Aug

Preparation of CIGS absorber layer

1. Preparation of Cu/In film by magnetron sputtering In order to accurately control the element ratio of Cu/In, CuIn film is prepared by the co-sputtering method. That is, the Cu/In alloy target and the In elemental target are simultaneously sputtered in the same sputtering chamber. The distribution of Cu/In content has a great influence on...
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4 Applications of High-purity Titanium Target Materials
12
Jul

4 Applications of High-purity Titanium Target Materials

As is known to all, purity is one of the main performance indexes of sputtering target materials, and the purity requirements of target materials are different in practical application. Compared with the general industrial pure titanium, the high-purity titanium target is expensive and has a narrow application range, which is mainly used to meet the...
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Thin Film Solar Cell
11
Jul

Merits and Demerits of Different Thin Film Solar Cell Target Materials

It is well known that different types and characteristics of transparent solar electrodes can be obtained by using different inorganic non-metallic oxides. However, due to the particularity of the solar cell, not all target materials are suitable. The following is a summary of the advantages and disadvantages of different thin film solar cell target materials....
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RotatableTargets
06
Jul

The Market Capacity and Development Trend of High-Purity Sputtering Target Industry

At present, high-purity sputtering target products are mainly used in the semiconductor industry and flat panel display industry. The market capacity and development trend of these fields are as follows. Semiconductor industry The high-purity sputtering target is rising with the development of the semiconductor industry, and integrated circuit industry has become one of the main...
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Target Material
05
Jul

What are the Primary Performances Requirements of Target Materials?

Purity Purity is one of the main performance indexes of target materials because the purity of target materials has a great influence on the performance of thin films. However, the purity requirements of target materials are not the same in practical application. For example, with the rapid development of the microelectronics industry, the size of...
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The Sputtering Target
03
Jul

Sputtering Target: An Important Component of Semiconductor Materials

Semiconductor materials can be divided into wafer materials and packaging materials. Compared with wafer manufacturing materials, packaging materials have relatively low technical barriers, so we mainly talk about wafer manufacturing materials. The production of wafer mainly involves 7 kinds of semiconductor materials and chemicals, each of which accounts for the following proportion in the semiconductor...
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LCD TV
19
Jun

What Are The ITO Target Applications?

As we all know, the technological development trend of the target material is closely related to the development trend of the film technology in the downstream application industry. With the technology improvement of the film products or components of the application industry, the target technology should also be changed. For example, Ic manufacturers, which have...
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