Chemical Formula: MgF2
Catalog Number: ST0246
CAS Number: 7783-40-6
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Magnesium fluoride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality MgF2 sputtering targets at the most competitive price.
Magnesium fluoride sputtering target from Stanford Advanced Materials is an inorganic compound with the formula MgF2. Magnesium fluoride is a white crystalline salt and is transparent over a wide range of wavelengths, with commercial uses in optics that are also used in space telescopes. It occurs naturally as the rare mineral sellaite. Magnesium fluoride target is used for thin film deposition.
Related Product: Magnesium Sputtering Target, Fluoride Ceramic Sputtering Target.
| Material Type | Magnesium Fluoride |
| Symbol | MgF2 |
| Color/Appearance | White, Crystalline Solid |
| Melting Point | 1,261℃ |
| Sputter | RF |
| Type of Bond | Indium, Elastomer |
| Comments | Substrate temp and rate control important. Reacts with W. Mo OK. |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Indium Bonding and Elastomeric Target Bonding Service are available for the MgF2 sputtering materials. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Magnesium fluoride sputter targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s magnesium fluoride sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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Super useful.
The package is tight.
The shipping is fast.
