Chemical Formula: HfF4
Catalog Number: ST0243
CAS Number: 13709-52-9
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Hafnium fluoride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality HfF4 sputtering targets at the most competitive price.
Hafnium fluoride sputtering target is a fluoride ceramic sputtering target composed of hafnium and fluorine.
Hafnium is a chemical element that originated from Copenhagen, Denmark (with the Latin name Hania). It was first mentioned in 1911 and observed by G. Urbain and V. Vernadsky. The isolation was later accomplished and announced by D. Coster and G. von Hevesy. “Hf” is the canonical chemical symbol of hafnium. Its atomic number in the periodic table of elements is 72 with the location at Period 6 and Group 4, belonging to the d-block. The relative atomic mass of hafnium is 178.49(2) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Hafnium Sputtering Target
Fluorine, also called fluorin, is a chemical element originated from the Latin ‘fluere’, meaning to flow. It was first mentioned in 1810 and observed by A.-M. Ampère. The isolation was later accomplished and announced by H. Moissan. “F” is the canonical chemical symbol of fluorine. Its atomic number in the periodic table of elements is 9 with location at Period 2 and Group 17, belonging to the p-block. The relative atomic mass of fluorine is 18.9984032(5) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Fluoride Ceramic Sputtering Target
The hafnium fluoride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our hafnium fluoride sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High-quality hafnium fluoride sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.
