Company Dynamic | Stanford Advanced Materials

August 6, 2018Julissa GreenBlog, Industrial News, Sputtering Target, Sputtering Technology0

Preparation of CIGS absorber layer

1. Preparation of Cu/In film by magnetron sputtering In order to accurately control the element ratio of Cu/In, CuIn film is prepared by the co-sputtering method. That is, the Cu/In alloy target and the In elemental target are simultaneously sputtered in the same sputtering chamber. The distribution of Cu/In content has a great influence on...

July 30, 2018Julissa GreenBlog, Sputtering Technology0

Four main molding methods for ITO (Indium Tin Oxide) targets

As is known, the ITO sputtering target is a black-gray ceramic semiconductor formed by a series of production processes after indium oxide and tin oxide powder are mixed in a certain proportion, and then sintered in a high-temperature atmosphere (1600 degrees, oxygen sintering). The ITO film was subjected to magnetron sputtering to oxidize the ITO target...

July 26, 2018Julissa GreenBlog, PVD, Sputtering Target, Sputtering Technology0

Influencing Factors of the Sputtering Deposition Rate of Magnetron Targets

Sputter deposition rate is a parameter that characterizes the film formation rate. In addition to the influencing factors such as the type and pressure of the working gas, target type and area size of the “sputter etched area”, and target surface temperature and target surface magnetic field strength, the deposition rate is also directly affected...

July 24, 2018Julissa GreenBlog, PVD0

What are the uses of PVD (Physical Vapor Deposition) coating?

PVD(Physical Vapor Deposition) coating, a physical terminology which is seemingly difficult to understand, actually is connected closely to our daily lives. Your beautiful jewelry, expensive camera and sharp knives may all use PVD coating. If you want to know more about PVD coating, just continue to read. What is PVD coating? PVD Coating, or...

July 18, 2018Julissa GreenBlog, Sputtering Target0

Common Targets And Corresponding Color

Common targets and corresponding color 1. Golden Color Series Ti series: Ti TiN Ti+Au TiN+Au Ti+Zr TiZrN Other: Zr ZrN Zr+Au ZrN+Au Hf HfN 2.Black Color Series Ti series: Ti TiCN Ti (C, O) TiAl TiAlN Ti50Al50 black Ti30Al70 dark TiAl (C, O, N) Other: Si ...

July 12, 2018Julissa GreenBlog, Industrial News, Sputtering Target0

4 Applications of High-purity Titanium Target Materials

As is known to all, purity is one of the main performance indexes of sputtering target materials, and the purity requirements of target materials are different in practical application. Compared with the general industrial pure titanium, the high-purity titanium target is expensive and has a narrow application range, which is mainly used to meet the...

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