(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

Company Dynamic

Detailed Introduction to Three Generations of Semiconductor Materials

What are the Three Generations of Semiconductor Materials? The first generation of semiconductor material The first generation of semiconductor materials mainly refers to silicon (Si) and germanium (Ge) materials. In the 1950s, Ge dominated the semiconductor market and was mainly used in low-voltage, low-frequency, medium-power transistors and photodetectors. However, Ge semiconductor devices were inferior in...
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Applications of Sputtering Target

Application and Development Prospect of the Sputtering Target

The sputtering target refers to the sputtering source that is deposited on a substrate to form various functional films under appropriate process conditions. Sputtering targets are widely used in many fields such as decoration, tooling, glass, electronic devices, semiconductors, and solar cells. Sputtering targets required in different fields vary. They can be classified into pure...
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Year in Review- 2018 Top Posts

Year in Review: 2018 Top Posts of SAM Sputter Target

Happy new year, my dear friends. We are very happy with your company and encouragement. SAM Sputter Target’s website has not been established for a long time, but we always insist on updating the news and knowledge about targets and coatings every week. On the occasion of the arrival of 2019, let us summarize the...
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Ultra low radiation coated glass building

Ultra low radiation silver-coated glass production process

Ultra low radiation silver-coated glass production process Low-emission coated glass has now been widely accepted by the public that this kind of glass is widely used in automobiles, doors and windows, and glass curtain walls. The core functional layer for low-emission coated glass is a silver film or silver-doped alloy film layer, which bears the...
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sputtering-target-purity

Effect of Sputtering Target Purity on Large-Area Coating Production

Effect of Sputtering Target Purity on Large-Area Coating Production The requirement of the target quality for sputter coating is higher than that of the traditional materials industry. When the substrate enters the high vacuum coating chamber, if the sputtering target is not pure enough, under the action of the electric field and the magnetic field,...
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Using Scandium Aluminum Sputtering Target to Prepare ScAlN Film

Scandium nitride (ScN) is a metal nitride semiconductor. The crystal structure of ScN is generally rock salt and non-polar. However, the first principle calculation indicates that ScN may also have a wurtzite structure and can be made into Sc-IIIA-Nitride. The IIIA nitride refers to AlN, GaN, and InN, and the structure of the nitride is...
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