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How to Solve Common Problems in Magnetron Sputtering

How to Solve Common Problems in Magnetron Sputtering?

Magnetron sputtering, a physical vapor deposition (PVD) process, is the main thin film deposition method for manufacturing semiconductor, disk drive, CD and optical devices. The following are common problems in magnetron sputtering. We have listed possible causes and related solutions for your information. Here is a quick look that may save your time. Problem 1: The...
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Major Problems and Answers in Coating Technology

Major Problems and Answers in Coating Technology

1. What types of coating technology can be divided into? (1) Vacuum coating (2) Electroplating (3) Chemical reaction (4) Heat treatment (5) Physical or mechanical treatment 2. What are the applications of plasma technology in surface technology? Sputter deposition: Sputtering is the use of high-speed ions to strike a solid sputter target, causing surface molecules...
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Does Titanium Never Corrode_

Does Titanium Never Corrode?

Titanium can be alloyed with iron, aluminum, vanadium, and molybdenum to produce strong, lightweight alloys for aerospace (jet engines, missiles, and spacecraft), military, industrial processes (chemicals and petrochemicals, desalination plants, pulp, and paper), automotive, marine, human implants, and other applications. In addition to low density and high specific strength, another important advantage of titanium alloy...
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electron beam evaporation

An Overview of Electron Beam Evaporation

Electron Beam Evaporation – Definition Electron beam evaporation, or E-beam evaporation, is a type of physical vapor deposition (PVD) technique, which directly heats the evaporation material (usually pellets) by using an electron beam under vacuum, and transports the vaporized material to the substrate to form a film. Electron Beam Evaporation – Working Processes Electron beam evaporation...
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Difference between Resistive Screen and Capacitive Screen

Difference between Resistive Screen and Capacitive Screen

Resistive touch screen is commonly called “soft screen”, which is mostly used in Windows Mobile system mobile phones; capacitive touch screen is commonly called “hard screen”, such as iPhone and G1 machines use this kind of screen quality. Indium tin oxide sputtering target is an important material for touch screens. For more information, please visit https://www.sputtertargets.net/. Resistive...
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Study on the Influence of Sputtering Targets on Sputter Coatings

Study on the Influence of Sputtering Targets on Sputter Coatings

AlxCr1-xN coatings have excellent mechanical properties and oxidation resistance and are therefore of high application value in a variety of industrial applications. In recent years, the effects of various deposition parameters (such as partial pressure, gas mixture or temperature) on the sputtering process have been studied, but there has been little research on the influence...
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