Company Dynamic

1. Introduction Sputtering is a key technology for thin-film deposition. It was first introduced in 1852 to deposit metals that couldn’t be applied through thermal evaporation. Over time, sputtering technology has advanced, leading to the development of magnetron sputtering. Magnetron sputtering uses magnetic fields to control the movement of electrons. This improves the process by...Continue Reading

Sputtering is a widely used process in various industries, from electronics to optics. High-temperature sputtering targets are essential for applications that require materials to perform under extreme conditions. Here are the top ten sputtering target materials known for their ability to withstand high temperatures, listed from highest to lowest melting point. 1. Tungsten Sputtering Target...Continue Reading

Introduction: Indium Tin Oxide (ITO) is widely used in modern flat-panel displays. It is a transparent conductor, a unique feature essential for display technologies like Liquid Crystal Displays (LCDs), Organic Light-Emitting Diodes (OLEDs), and touch screens. ITO combines high electrical conductivity with optical transparency, which makes it a popular choice for these applications. This article...Continue Reading