Cobalt (Co) sputtering targets are widely used in the production of thin films for various applications, including electronics, optics, and decorative coatings. In addition to pure cobalt sputtering targets, there are also cobalt-containing targets that can be tailored to different compositions to meet specific requirements. These targets may contain cobalt alloys (such as CoCr, CoNi, CoFe, etc.), or may be doped with other elements (such as nitrogen, oxygen, or carbon) to modify the film properties. The use of cobalt (Co) sputtering targets allows for precise control over the deposition process, resulting in high-quality and uniform thin films with excellent adhesion and other desirable properties. Cobalt-containing targets are therefore an important category in the field of sputtering technology, enabling the production of advanced materials with a wide range of functionalities and applications.