| Catalog No. | ST0903 |
| Chemical Formula | Co/Ni/V |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Cobalt Nickel Vanadium High-Entropy Alloy (HEA) Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality CoNiV High-Entropy Alloy (HEA) Sputtering Target at the most competitive prices.
CoNiV High-Entropy Alloy (HEA) Sputtering Target is a specialized material used in the sputter deposition process, primarily in industries such as semiconductor manufacturing and thin-film coating. Sputter deposition is a widely used technique for depositing thin films of material onto a substrate, and it plays a crucial role in the production of various electronic devices, photovoltaic cells, and coatings for surfaces.
High-entropy alloys (HEAs) are a class of materials known for their unique properties, resulting from their composition of multiple elements in roughly equal proportions. These alloys can exhibit excellent mechanical strength, corrosion resistance, and thermal stability, depending on the specific combination of elements used.
CoNiV High-Entropy Alloy (HEA) Sputtering Target plays a crucial role in the production of various electronic devices, photovoltaic cells, and coatings for surfaces.
Our CoNiV High-Entropy Alloy (HEA) Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s CoNiV High-Entropy Alloy (HEA) Sputtering Targets are available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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