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Sputtering Target
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By Chemical Elements
Evaporation Materials
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By Chemical Elements
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E-Beam Source Used Crucibles
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Sputtering Target
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By Chemical Elements
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ST0141 Chromium Oxide Sputtering Target, Cr2O3
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ST0187 Chromium-doped Silicon Monoxide Sputtering Target, SiO/Cr
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ST0210 Chromium Nitride Sputtering Target, Cr2N
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ST0222 Chromium Carbide Sputtering Target, Cr3C2
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ST0239 Chromium Fluoride Sputtering Target, CrF3
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ST0260 Chromium Silicide Sputtering Target, CrSi2
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ST0276 Chromium Sulfide Sputtering Target, Cr2S3
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ST0292 Chromium Boride Sputtering Target, CrB2
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ST0448 Lanthanum Strontium Chromate Sputtering Target, La(1-x)SrxCrO3
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ST0508 Silicon Chromium Sputtering Target, Si/Cr
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ST0513 Chromium Trioxide Sputtering Target, CrO3
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ST0900 Chromium Cobalt Nickel High-Entropy Alloy (HEA) Sputtering Target, Co/Cr/Ni
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ST0901 Cobalt Chromium Iron Nickel Aluminum High-Entropy Alloy (HEA) Sputtering Target, Co/Cr/Fe/Ni/Al
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ST0902 Cobalt Chromium Iron Nickel Manganese High-Entropy Alloy (HEA) Sputtering Target, Co/Cr/Fe/Ni/Mn
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ST0912 Inconel 600 Sputtering Targets, Ni/Cr/Fe
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ST0917 Stainless Steel Sputtering Target
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Featured Products
ST1013 Barium Strontium Titanate Sputtering Target, BaxSr(1-x)TiO3
ST1012 Barium Carbonate Sputtering Target, BaCO3
ST1011 Chromium Silicide Sputtering Target, Cr3Si
ST1010 Manganese Oxide Sputtering Target, Mn2O3
ST1009 Cadmium Zinc Sulfide Sputtering Target, ZnS-CdS