| Catalog No. | ST0900 |
| Chemical Formula | Co/Cr/Ni |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Chromium Cobalt Nickel High-Entropy Alloy (HEA) Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality CoCrNi High-Entropy Alloy (HEA) Sputtering Target at the most competitive prices.
CoCrNi High-Entropy Alloy (HEA) Sputtering Target is a material used in thin film deposition processes, specifically in sputtering techniques. It is composed of cobalt (Co), chromium (Cr), and nickel (Ni) elements. Sputtering targets are used in physical vapor deposition (PVD) processes where a high-energy ion beam bombards the target to dislodge atoms from its surface. These atoms are then deposited onto a substrate to create a thin film with the desired characteristics.
CoCrNi High-Entropy Alloy (HEA) Sputtering Targets are commonly used in industries such as electronics, optics, solar cells, and semiconductor manufacturing.
Our CoCrNi High-Entropy Alloy (HEA) Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s CoCrNi High-Entropy Alloy (HEA) Sputtering Targets are available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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