Common metal materials (such as low carbon steel, metal uranium, etc.) are very reactive and prone to corrosion and performance degradation. Therefore, people have been working on the research and preparation of anti-corrosion films for steel materials. Applying a relatively thin protective film on the surface of the metal material, such as aluminum, zinc, magnesium...Continue Reading

Introduction Ceramic is the general term for pottery and porcelain. The components of the ceramic material are mainly silicon oxide, aluminum oxide, potassium oxide, sodium oxide, calcium oxide, magnesium oxide, iron oxide, titanium oxide and etc. Common ceramic raw materials are clay, quartz, potassium sodium feldspar and etc. They generally have higher hardness but poor...Continue Reading

1. Preparation of Cu/In film by magnetron sputtering In order to accurately control the element ratio of Cu/In, CuIn film is prepared by the co-sputtering method. That is, the Cu/In alloy target and the In elemental target are simultaneously sputtered in the same sputtering chamber. The distribution of Cu/In content has a great influence on...Continue Reading

Sputter deposition rate is a parameter that characterizes the film formation rate. In addition to the influencing factors such as the type and pressure of the working gas, target type and area size of the “sputter etched area”, and target surface temperature and target surface magnetic field strength, the deposition rate is also directly affected...Continue Reading

Common targets and corresponding color 1. Golden Color Series Ti series: Ti       TiN Ti+Au    TiN+Au Ti+Zr    TiZrN Other: Zr          ZrN Zr+Au    ZrN+Au Hf        HfN 2.Black Color Series Ti series: Ti        TiCN Ti (C, O) TiAl    TiAlN Ti50Al50    black Ti30Al70    dark TiAl (C, O, N) Other: Si ...Continue Reading

As is known to all, purity is one of the main performance indexes of sputtering target materials, and the purity requirements of target materials are different in practical application. Compared with the general industrial pure titanium, the high-purity titanium target is expensive and has a narrow application range, which is mainly used to meet the...Continue Reading

It is well known that different types and characteristics of transparent solar electrodes can be obtained by using different inorganic non-metallic oxides. However, due to the particularity of the solar cell, not all target materials are suitable. The following is a summary of the advantages and disadvantages of different thin film solar cell target materials....Continue Reading

Molybdenum sputtering targets can form films on various kinds of substrates, which are widely used as electronic components and products. In this article, we will explore the various applications of molybdenum sputtering targets. These targets play a vital role in the electronics and renewable energy industries, enabling the deposition of thin films on diverse substrates. Let’s...Continue Reading

Purity Purity is one of the main performance indexes of target materials because the purity of target materials has a great influence on the performance of thin films. However, the purity requirements of target materials are not the same in practical application. For example, with the rapid development of the microelectronics industry, the size of...Continue Reading