What is PVD Coating Technology? Physical Vapor Deposition (PVD) is a thin film preparation technique that physically vaporizes the surface of a material source (solid or liquid) into gaseous atoms, molecules, or partially ionized into ions under vacuum conditions. Then, a film having a specific function is deposited on the surface of the substrate by...Continue Reading

Metal titanium and titanium sputtering target are essentially the same, both of which are composed of titanium element; the difference is that metal titanium is more like a raw material, and titanium target is more like a titanium product. Titanium as a raw material can be made into titanium sputtering targets by several methods, and...Continue Reading

If there is a metal that is ignored by us, I think that is scandium. Scandium is found in most rare earth elements and uranium deposits, but it can only be extracted from a few mines around the world. Due to the low availability and difficulty in preparation, which was succeeded in 1937, of scandium,...Continue Reading

The case A well-known industrial glass company—-We attempted to deposit a silver film about one micron thick on the glass substrate using silver evaporation materials by vacuum evaporation. And our existing coating facilities are limited that we can only use electron beam evaporation. We tried Ag / Ti glass in the beginning, but the silver...Continue Reading

The sputtering target is an important material for physical vapor deposition, the most widely used technology for depositing materials. As its name suggests, “physical” means that the PVD coating method involves a purely physical process. During the physical vapor deposition, a solid target material is broken up into the vapor state (usually in a high...Continue Reading

Magnetron sputtering is a physical vapor deposition method that allows the deposition of various materials, including metals, oxides, ceramics and etc. by using a specially formed magnetic field applied to a diode sputtering target. The deposition rate, or the film formation rate, is an important parameter that measures the effectiveness of the magnetron sputtering machine....Continue Reading

The yttrium oxide dielectric film refers to a thin film material as a dielectric, which is an important component and ideal material of a hybrid integrated circuit used in the electronics industry. Yttrium Oxide Dielectric Film Properties Y2O3 is a white powder with a crystal structure of body-centered cubic. Yttrium Oxide Dielectric Film has good...Continue Reading

Introduction Sputtering targets are essential materials used in the deposition of thin films through a process known as sputtering, a cornerstone technique in semiconductor manufacturing and surface coating technologies. Aluminum scandium sputtering targets, consisting of an aluminum alloy with scandium, represent a significant advancement in this field. The addition of scandium to aluminum not only...Continue Reading

The Semiconductor Market: Opportunities and Threats From both of the perspective of technology or economic development, the importance of semiconductors is enormous. Most of today’s electronic products, such as computers, mobile phones or digital recorders, have a very close relationship with semiconductors. Along with the rapid development, the semiconductor market also faces some challenges. First,...Continue Reading