Introduction Plasma spray coating is a form of thermal spraying. It involves heating a material electrically and spraying it on the substrate to be coated. This process can be used on a large surface area at a higher deposition rate than most other methods of thin-film deposition. A wide range of materials can be used...Continue Reading
Introduction Chemical vapor deposition is a coating method that is commonly used to produce thin films and coatings of very high quality. Gaseous reactants are usually used in this process. In chemical vapor deposition, you transport one or more volatile precursors to the reaction chamber. The volatile precursors usually decompose on a heated substrate surface...Continue Reading
What is CIGS Thin-Film Photovoltaic? Thin-film photovoltaics, also called solar cells, are devices that convert light energy into electrical energy using the photovoltaic effect. The photovoltaic effect explains how voltage is produced when light strikes a material. CIGS (copper indium gallium selenide) is a semiconductor material most popularly known for its use in solar cells with...Continue Reading
What is Magnetron Sputtering? Sputtering is the process in which the atoms or molecules of a material are ejected from a target by bombarding the target with high-energy particles. This is called DC sputtering or diode sputtering. A major disadvantage of such a sputtering technique is that it has very low deposition rates and involves...Continue Reading
The magnetron sputtering system has been in use for several decades now. Even recently, there have been advancements that have improved the performance of the sputtering system in general. For instance, the closed-field unbalanced magnetron sputtering technique has now been developed so that it can be routinely used to deposit high-quality coatings of an extensive...Continue Reading
Arc Ion Plating is a technological process developed in the United States of America in the 60s. Since then, it has become more widely used and accepted in other parts of the world. Energy from evaporation as well as ionization is incorporated to achieve the goal of arc ion plating. The goal of arc ion...Continue Reading
Magnetron sputtering is one of the most popular methods for sputter deposition. Powerful magnets confine plasma electrons close to the target. It entails depositing material from a source to a substrate via sputtering using a high magnetic and electric field. It is generally used to deposit alloys, metals, and other materials on a substrate. It was first...Continue Reading
Titanium nitride, also known as TiNite or TiN, is a chemical compound that is commonly used in coating objects. Titanium nitride thin film gives the coated object a gold color. It is widely used because it is less expensive than most other compounds with similar chemical properties. There are numerous commercial variants of titanium nitride, but...Continue Reading
White meals are an important category of metals used in various industrial applications, just as alloys are. An old use of white metals is their referencing in the antique trade for describing items suspected of containing silver but not hallmarked. As an example, the term “white metal” is used in the British fine art trade...Continue Reading
