Sputter deposition rate is a parameter that characterizes the film formation rate. In addition to the influencing factors such as the type and pressure of the working gas, target type and area size of the “sputter etched area”, and target surface temperature and target surface magnetic field strength, the deposition rate is also directly affected...Continue Reading

PVD(Physical Vapor Deposition) coating, a physical terminology which is seemingly difficult to understand, actually is connected closely to our daily lives. Your beautiful jewelry, expensive camera and sharp knives may all use PVD coating. If you want to know more about PVD coating, just continue to read.   What is PVD coating? PVD Coating, or...Continue Reading

A vacuum evaporation film, in an environment of no less than 10-2Pa vacuum, which is heated by resistance heating or electron beam and laser bombardment to heat the evaporated material to a fixed temperature so that the thermal vibration energy of the molecules or atoms in the material exceeds the binding energy of the surface,...Continue Reading

In modern life, people can not get away from sputtering targets at all times. Smartphones, credit cards, cameras, two generation ID cards… They all have a chip. The ultra-thin metal wire, which is nearly 10000 meters in length, is made of the sputtering target. High purity sputtering target is a key material in semiconductor chip...Continue Reading

3D printing is increasingly used in the manufacture of various end-use products, but it can also help researchers achieve the ultimate goal. One good example is the recent project, the ORNL in Tennessee, operated by the DOE, and has been responsible for many 3D printing innovations to help them by providing research and development work....Continue Reading