As is known, the ITO sputtering target is a black-gray ceramic semiconductor formed by a series of production processes after indium oxide and tin oxide powder are mixed in a certain proportion, and then sintered in a high-temperature atmosphere (1600 degrees, oxygen sintering). The ITO film was subjected to magnetron sputtering to oxidize the ITO target...Continue Reading

Sputter deposition rate is a parameter that characterizes the film formation rate. In addition to the influencing factors such as the type and pressure of the working gas, target type and area size of the “sputter etched area”, and target surface temperature and target surface magnetic field strength, the deposition rate is also directly affected...Continue Reading

PVD(Physical Vapor Deposition) coating, a physical terminology which is seemingly difficult to understand, actually is connected closely to our daily lives. Your beautiful jewelry, expensive camera and sharp knives may all use PVD coating. If you want to know more about PVD coating, just continue to read.   What is PVD coating? PVD Coating, or...Continue Reading

Common targets and corresponding color 1. Golden Color Series Ti series: Ti       TiN Ti+Au    TiN+Au Ti+Zr    TiZrN Other: Zr          ZrN Zr+Au    ZrN+Au Hf        HfN 2.Black Color Series Ti series: Ti        TiCN Ti (C, O) TiAl    TiAlN Ti50Al50    black Ti30Al70    dark TiAl (C, O, N) Other: Si ...Continue Reading

As is known to all, purity is one of the main performance indexes of sputtering target materials, and the purity requirements of target materials are different in practical application. Compared with the general industrial pure titanium, the high-purity titanium target is expensive and has a narrow application range, which is mainly used to meet the...Continue Reading

It is well known that different types and characteristics of transparent solar electrodes can be obtained by using different inorganic non-metallic oxides. However, due to the particularity of the solar cell, not all target materials are suitable. The following is a summary of the advantages and disadvantages of different thin film solar cell target materials....Continue Reading

Molybdenum sputtering targets can form films on various kinds of substrates, which are widely used as electronic components and products. In this article, we will explore the various applications of molybdenum sputtering targets. These targets play a vital role in the electronics and renewable energy industries, enabling the deposition of thin films on diverse substrates. Let’s...Continue Reading

At present, high-purity sputtering target products are mainly used in the semiconductor industry and flat panel display industry. The market capacity and development trend of these fields are as follows. Semiconductor industry The high-purity sputtering target is rising with the development of the semiconductor industry, and integrated circuit industry has become one of the main...Continue Reading

Purity Purity is one of the main performance indexes of target materials because the purity of target materials has a great influence on the performance of thin films. However, the purity requirements of target materials are not the same in practical application. For example, with the rapid development of the microelectronics industry, the size of...Continue Reading