Since tantalum has the ability to form oxides thin film, which has a protective effect, the tantalum target is widely used as a base material for electrolytic capacitor manufacturing. This article introduces the application of tantalum sputtering targets in the field of microelectronics. Tantalum for Thermal Inkjet Print Head Application Thermal inkjet print heads can be used...Continue Reading

When it comes to ITO, many people first think of the International Trade Organization. If you think this article is about the International Trade Organization, then I am sorry to tell you that maybe you can stop reading now, because ITO in this passage refers to indium tin oxide. Do you think these three words...Continue Reading

Common target shapes are rectangular planar targets and rotatory targets. From the name we can imagine what they look like, as shown below. The targets of these two shapes have their own advantages and disadvantages. For details, please refer to our previous news Advantages and Disadvantages of Planar target and Rotatory targets. Today, the focus...Continue Reading

In recent years, with the rapid development of coating technology, the demand for sputtering targets has increased rapidly. Then some people who are unfamiliar with sputtering targets may doubt: What are the applications of sputtering targets? The following is a detailed summary by SAM Sputter Targets.   Decorative coating Decorative coating mainly refers to the...Continue Reading

Preparation It is very important to keep the vacuum chamber clean. Some residues formed during use will collect moisture and other pollutants, directly affecting the success rate of vacuum coating. Short-circuit or target arcing, film-forming surface roughness, and chemical impurities are often exceeded due to unclean sputtering chambers, sputter guns, and targets. In order to...Continue Reading

Common metal materials (such as low carbon steel, metal uranium, etc.) are very reactive and prone to corrosion and performance degradation. Therefore, people have been working on the research and preparation of anti-corrosion films for steel materials. Applying a relatively thin protective film on the surface of the metal material, such as aluminum, zinc, magnesium...Continue Reading

Target magnetic field The cathode operating voltage of magnetron sputtering decreases as the target surface magnetic field increases, and also decreases as the sputtering etch groove of the target surface deepens. The sputtering current increases as the sputter etch bath of the target surface deepens because the sputter etched surface of the target gets closer...Continue Reading

Introduction Ceramic is the general term for pottery and porcelain. The components of the ceramic material are mainly silicon oxide, aluminum oxide, potassium oxide, sodium oxide, calcium oxide, magnesium oxide, iron oxide, titanium oxide and etc. Common ceramic raw materials are clay, quartz, potassium sodium feldspar and etc. They generally have higher hardness but poor...Continue Reading

1. Preparation of Cu/In film by magnetron sputtering In order to accurately control the element ratio of Cu/In, CuIn film is prepared by the co-sputtering method. That is, the Cu/In alloy target and the In elemental target are simultaneously sputtered in the same sputtering chamber. The distribution of Cu/In content has a great influence on...Continue Reading