Chemical Formula: C
Catalog Number: ST0413
CAS Number: 7440-44-0
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Stanford Advanced Materials (SAM) provides high-purity carbon sputtering targets with exceptional quality and consistency. Our advanced manufacturing capabilities allow us to offer standard sizes and customized solutions tailored to your specific requirements.
The carbon sputtering target inherits the properties of carbon, a versatile element known for its high thermal conductivity, electrical conductivity, and chemical stability. With its hexagonal crystal structure, carbon exhibits unique properties, including:
Carbon, symbolized as “C,” is a tetravalent non-metal with atomic number 6, occurring in various allotropes such as graphite, diamond, and amorphous carbon. SAM’s carbon sputtering targets are engineered for use in high-precision thin film deposition processes.
| Material Type | Carbon |
| Symbol | C |
| Color/Appearance | Black solid |
| Melting Point | 3652–3697 °C |
| Boiling Point | 4200 °C |
| Density | 2.267 g/cm³ |
| Thermal Conductivity | 80–240 W/m.K |
| Coefficient of Expansion | 7.1 x 10⁻⁶/K |
| Available Sizes | Dia.: 1.0″–14.0″, Thick: 0.125″, 0.250″ |
| Bonding Options | Indium bonding available |
Standard Dimensions and Customization Options
| Shape | Diameter/Dimensions | Thickness | Customization |
|---|---|---|---|
| Circular Targets | 1.0″–14.0″ | 0.125″, 0.250″ | Available |
| Block Targets | Length ≤ 32″, Width ≤ 12″ | Thickness ≥ 1 mm | Available |
For customized dimensions, please contact us for more details.
Carbon sputtering targets are essential in thin film deposition for a wide range of industries, including:
Additionally, carbon is used in nuclear applications as a neutron moderator and in steel manufacturing as an alloying element.
Our C sputter target products are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
Carbon sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
Submit your review | |
I needed a non-standard size for a specific application, and SAM provided exactly what I was looking for. The carbon target performed flawlessly, and their customer service was top-notch. Will definitely order again!
I’ve been using SAM’s carbon sputtering targets for my thin film deposition projects, and they always deliver great results. The uniformity and purity are excellent, and the targets last much longer than expected. Highly recommend SAM for anyone needing high-quality materials!
Individually boxed and shipped nicely. Will buy them from SAM again.
