Chemical Formula: Fe3C
Catalog Number: ST0224
CAS Number: 12011-67-5
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The iron carbide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality iron carbide sputter targets at the most competitive prices.
Iron Carbide sputtering target from Stanford Advanced Materials is a carbide ceramic sputtering material with the formula Fe3C.
Iron, also called ferrum, is a chemical element originated from the Anglo-Saxon name iren (ferrum in Latin). It was early used before 5000 BC. “Fe” is the canonical chemical symbol of iron. Its atomic number in the periodic table of elements is 26 with location at Period 4 and Group 8, belonging to the d-block. The relative atomic mass of iron is 55.845(2) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Iron Sputtering Target
Carbon is a chemical element originated from the Latin ‘carbo’, meaning charcoal. It was early used in 3750 BC and discovered by Egyptians and Sumerians. “C” is the canonical chemical symbol of carbon. Its atomic number in the periodic table of elements is 6 with location at Period 2 and Group 14, belonging to the p-block. The relative atomic mass of carbon is 12.0107(8) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Carbide Ceramic Sputtering Target
| Compound Formula | Fe3C |
| Molecular Weight | 179.55 |
| Appearance | Solid |
| Melting Point | 1227 °C (2241 °F) |
| Density | 7.694 g/cm3 |
Our iron carbide sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s iron carbide sputtering targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
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I got a piece of 4" iron carbide target for a sputtering system. They worked great.
