Blog | Stanford Advanced Materials

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. We update every week about news and knowledge of sputtering targets and evaporation materials. Here are the blogs we published previously.

August 6, 2018Blog, Industrial News, Sputtering Target, Sputtering Technology

Preparation of CIGS absorber layer

1. Preparation of Cu/In film by magnetron sputtering In order to accurately control the element ratio of Cu/In, CuIn film is prepared by the co-sputtering method. That is, the Cu/In alloy target and the In elemental target are simultaneously sputtered in the same sputtering chamber. The distribution of Cu/In content has a great influence on...

July 30, 2018Blog, Sputtering Technology

Four main molding methods for ITO (Indium Tin Oxide) targets

As is known, the ITO sputtering target is a black-gray ceramic semiconductor formed by a series of production processes after indium oxide and tin oxide powder are mixed in a certain proportion, and then sintered in a high-temperature atmosphere (1600 degrees, oxygen sintering). The ITO film was subjected to magnetron sputtering to oxidize the ITO target...

July 26, 2018Blog, PVD, Sputtering Target, Sputtering Technology

Influencing Factors of the Sputtering Deposition Rate of Magnetron Targets

Sputter deposition rate is a parameter that characterizes the film formation rate. In addition to the influencing factors such as the type and pressure of the working gas, target type and area size of the “sputter etched area”, and target surface temperature and target surface magnetic field strength, the deposition rate is also directly affected...

July 24, 2018Blog, PVD

What are the uses of PVD (Physical Vapor Deposition) coating?

PVD(Physical Vapor Deposition) coating, a physical terminology which is seemingly difficult to understand, actually is connected closely to our daily lives. Your beautiful jewelry, expensive camera and sharp knives may all use PVD coating. If you want to know more about PVD coating, just continue to read. What is PVD coating? PVD Coating, or...

July 18, 2018Blog, Sputtering Target

Common Targets And Corresponding Color

Common targets and corresponding color 1. Golden Color Series Ti series: Ti TiN Ti+Au TiN+Au Ti+Zr TiZrN Other: Zr ZrN Zr+Au ZrN+Au Hf HfN 2.Black Color Series Ti series: Ti TiCN Ti (C, O) TiAl TiAlN Ti50Al50 black Ti30Al70 dark TiAl (C, O, N) Other: Si ...

July 12, 2018Blog, Industrial News, Sputtering Target

4 Applications of High-purity Titanium Target Materials

As is known to all, purity is one of the main performance indexes of sputtering target materials, and the purity requirements of target materials are different in practical application. Compared with the general industrial pure titanium, the high-purity titanium target is expensive and has a narrow application range, which is mainly used to meet the...

July 11, 2018Blog, Industrial News, Metal, Sputtering Target

Merits and Demerits of Different Thin Film Solar Cell Target Materials

It is well known that different types and characteristics of transparent solar electrodes can be obtained by using different inorganic non-metallic oxides. However, due to the particularity of the solar cell, not all target materials are suitable. The following is a summary of the advantages and disadvantages of different thin film solar cell target materials....

July 10, 2018Blog, Metal, Sputtering Target

What Are the Uses of Molybdenum Sputtering Targets?

Molybdenum sputtering targets can form films on various kinds of substrates, which are widely used as electronic components and products. In this article, we will explore the various applications of molybdenum sputtering targets. These targets play a vital role in the electronics and renewable energy industries, enabling the deposition of thin films on diverse substrates. Let’s...

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