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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

Blogs

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. We update every week about news and knowledge of sputtering targets and evaporation materials. Here are the blogs we published previously.

tungsten crucible

Tungsten Crucible: A Good Choice For Scientific Experiments

Tungsten crucibles are essential tools in both scientific research and industrial applications, prized for their remarkable resistance to high temperatures and corrosive environments. Crafted from tungsten, one of the metals with the highest melting point, these crucibles are uniquely suited to processes requiring extreme conditions, such as metal smelting and chemical experiments. Their ability to...
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Aluminum titanium sputtering target

Why should you choose Aluminum Titanium sputtering target?

Aluminum titanium alloy Aluminum titanium alloy is a kind of metal material with high die-casting yield, high density, high strength and flexibility. The difference between aluminum titanium alloy and titanium aluminum alloy is the proportion of these two elements. The element appears earlier has a larger proportion. Aluminum titanium alloy usually contains 0.50 to 1.20%...
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AlN semiconductor wafer

Introduction to Aluminum Nitride Semiconductor

Development of Semiconductor Materials 1 The first generation of semiconductor: represented by Si, Ge semiconductor materials; 2 The second generation of semiconductor: represented by GaAs, InP semiconductor materials; 3 The third generation of semiconductor: represented by several wide-bandgap semiconductor materials such as silicon carbide (SiC), gallium nitride (GaN), zinc oxide (ZnO), diamond, and aluminum nitride...
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different target shapes

Things you should know about sputter coating

Almost all new sputter deposition equipment uses a powerful magnet to spiral the electrons to accelerate the ionization of the argon around the target, resulting in an increased probability of collision between the sputtering target and the argon ions, and thus the sputtering rate is increased. Generally, most metal films uses DC sputtering, while non-conductive...
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Aluminum Scandium alloy

What is Aluminum Scandium alloy?

What is Aluminum Scandium alloy? Aluminum Scandium alloy is a kind of high-performance aluminum alloy. There are several ways to improve the performance of aluminum alloy. In the past 20 years, micro-alloying and toughening is the frontier of high-performance aluminum alloy research. Features Adding a small amount of scandium to the aluminum alloy can promote...
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titanium connecting rod

How to reduce the price of titanium alloy?

Titanium alloys have been widely used in the aerospace industry. However, in recent years, although the aerospace industry is still the biggest market, the research and development direction of titanium alloys has shifted from the aerospace industry to the civilian industry. Titanium alloys applied for aerospace industry tend to have excellent performance but are EXPENSIVE....
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cold pressing

Advantages and disadvantages of different preparation methods for ITO targets

Previously, we have introduced Four main molding methods for ITO targets, mainly about their definitions and characteristics. And today I think it necessary to talk about the advantages and disadvantages of each method, which is helpful for you to make choices between them when you want to prepare ITO targets. Hot Pressing The hot pressing...
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Zn powder

How to use ZnO or Zn powder to make a large diameter sputtering target?

How to use ZnO or Zn powder to make a large diameter sputtering target? If you want to make a sputtering target by using ZnO or Zn powder, you have to know the following points. How to make a sputtering target? There are two main ways to make a sputtering target. One is casting. The...
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