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The sputtering target is an important material for physical vapor deposition, the most widely used technology for depositing materials. As its name suggests, “physical” means that the PVD coating method involves a purely physical process. During the physical vapor deposition, a solid target material is broken up into the vapor state (usually in a high...Continue Reading

Magnetron sputtering is a physical vapor deposition method that allows the deposition of various materials, including metals, oxides, ceramics and etc. by using a specially formed magnetic field applied to a diode sputtering target. The deposition rate, or the film formation rate, is an important parameter that measures the effectiveness of the magnetron sputtering machine....Continue Reading

Introduction Sputtering targets are essential materials used in the deposition of thin films through a process known as sputtering, a cornerstone technique in semiconductor manufacturing and surface coating technologies. Aluminum scandium sputtering targets, consisting of an aluminum alloy with scandium, represent a significant advancement in this field. The addition of scandium to aluminum not only...Continue Reading

The Semiconductor Market: Opportunities and Threats From both of the perspective of technology or economic development, the importance of semiconductors is enormous. Most of today’s electronic products, such as computers, mobile phones or digital recorders, have a very close relationship with semiconductors. Along with the rapid development, the semiconductor market also faces some challenges. First,...Continue Reading

When it comes to the abbreviation “ITO”, it can stand for International Trade Organization, Involuntary Treatment Order, or Information Technology Outsourcing. But in chemistry, “ITO” refers directly to a crucial chemical material — Indium Tin Oxide. What is Indium Tin Oxide in Chemistry? Indium tin oxide (ITO) is a black-gray ceramic material composed of indium oxide...Continue Reading