(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

Category

Sputtering Target
Recent Studies on Titanium Dioxide Film
Titanium dioxide (TiO2) is a hard and chemically resistant oxide of titanium. Using TiO2 sputtering target can obtain good quality titanium dioxide films, which have been widely used in various applications due to their multiple interesting properties. The first half of this passage introduces some of the properties and applications of titanium oxide film, and the latter...
Continue Reading
all-types-of-sputtering-target
Sputtering is a method of physical vapor deposition (PVD) technologies and is one of the main techniques for preparing electronic thin film materials. It utilizes the ions generated by the ion source to accelerate the aggregation in a high vacuum to form an ion beam with high speed and high energy. The ion beam bombards...
Continue Reading
5 Points For Sputtering Target Maintenance
Sputtering Target Maintenance In order to avoid short circuit and arc initiation caused by the unclean cavity in the sputtering process, it is necessary to remove the accumulated sputtering materials deposited in the middle and on both sides of the sputtering track in stages. It is also helpful for users to continuously sputtering with the...
Continue Reading
Elements used in one phone
Metal elements have many applications in mobile phones. And today we tend to mention two important ones–molybdenum and titanium. The main use of tantalum materials in electronic products comes in the creation of the tantalum capacitor; and the main use of molybdenum in mobile phones mainly related to the liquid crystal display coating: using magnetron...
Continue Reading
An Overview of Aluminum Sputtering Target
You may be familiar with aluminum but unfamiliar with aluminum sputter targets. But to some extent, they are the same, consisting of atom Al. In a word, the aluminum sputtering target can be considered a product after a series of processes from high-purity aluminum. Aluminum target is a type of sputtering material used mounted on a vacuum...
Continue Reading
2018 MRS Fall Meeting
As a global advanced materials supplier, Stanford Advanced Materials (SAM) is pleased to announce that we will participate in the 2018 MRS Fall Exhibit, where over 240 international exhibitors from all sectors of the global materials science and engineering communities will display a full spectrum of equipment, instrumentation, products, software, publications, and services. The exhibition...
Continue Reading
CIGS solar film
It is known to us that by applying different sputtering targets, we can obtain solar transparent electrodes of different kinds and characteristics can be obtained. However, not all targets can be applied to solar cells. The following is a summary of three main sputtering targets used in the solar industry. ITO targets Indium tin oxide...
Continue Reading
Everything about ito sputtering target
Definition of ITO Sputtering Target The full name of ITO is indium tin oxide, a composition of indium, tin, and oxygen with different proportions. The substance of ITO and ITO sputtering target is the same, the latter of which is actually a black-gray ceramic semiconductor formed by mixing indium oxide and tin oxide powder in...
Continue Reading
Applications and Requirements of Titanium Sputtering Target in High-Tech Industries
Requirements of Titanium Sputtering Target Titanium sputtering target is widely used in high-tech fields, such as electronics, information industry, home decoration, automobile glass manufacturing, etc. In these industries, titanium target is mainly used for coating the surface of components, such as integrated circuits, flat panel displays, or as a decorative coating, glass coating, etc. Different industries...
Continue Reading
1 7 8 9 10 11 12