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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

Category

Sputtering Target
Thin Film Solar Cell
It is well known that different types and characteristics of transparent solar electrodes can be obtained by using different inorganic non-metallic oxides. However, due to the particularity of the solar cell, not all target materials are suitable. The following is a summary of the advantages and disadvantages of different thin film solar cell target materials....
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Molybdenum Sputtering Targets
Molybdenum sputtering targets can form films on various kinds of substrates, which are widely used as electronic components and products. In this article, we will explore the various applications of molybdenum sputtering targets. These targets play a vital role in the electronics and renewable energy industries, enabling the deposition of thin films on diverse substrates. Let’s...
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Target Material
Purity Purity is one of the main performance indexes of target materials because the purity of target materials has a great influence on the performance of thin films. However, the purity requirements of target materials are not the same in practical application. For example, with the rapid development of the microelectronics industry, the size of...
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target application
Sputtering target is the key material for vacuum magnetron sputtering (PVD) coating. Working principle of target material: The target material is used as the cathode in the PVD system. The free electrons produced by the vacuum system impact the Ar molecule and form the Ar+ cation under the acceleration of the electric field, and the...
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Ti alloy targets
Titanium targets are widely used in decorative coatings, wear-resistant coatings, electronic industries such as CD, VCD, and all kinds of magnetic disk coating. Tungsten titanium (W-Ti) films and tungsten titanium (W-Ti) based alloy films are high-temperature alloy films, which possess a series of irreplaceable good properties. Tungsten has the high melting point, high strength, and...
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LCD TV
As we all know, the technological development trend of the target material is closely related to the development trend of the film technology in the downstream application industry. With the technology improvement of the film products or components of the application industry, the target technology should also be changed. For example, Ic manufacturers, which have...
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plate display
High purity sputtering target, includes aluminum target, titanium target, tantalum target, tungsten titanium target, and so on. The sputtering target is mainly related to the four fields of plate display, semiconductor, storage and solar cell. 1, aluminum target High purity aluminum and its alloys are one of the most widely used conductive film materials. In...
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Sputtering Target-Potential Material King
In every era, some materials have followed the mainstream trend to become the best in the industry. In the past two years, the basic metal took off from the real estate. The new energy vehicles led the lithium, cobalt and other small metals. In the present situation, the development of the chip industry as the...
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