As is known to all, purity is one of the main performance indexes of sputtering target materials, and the purity requirements of target materials are different in practical application. Compared with the general industrial pure titanium, the high-purity titanium target is expensive and has a narrow application range, which is mainly used to meet the...Continue Reading
It is well known that different types and characteristics of transparent solar electrodes can be obtained by using different inorganic non-metallic oxides. However, due to the particularity of the solar cell, not all target materials are suitable. The following is a summary of the advantages and disadvantages of different thin film solar cell target materials....Continue Reading
Molybdenum sputtering targets can form films on various kinds of substrates, which are widely used as electronic components and products. In this article, we will explore the various applications of molybdenum sputtering targets. These targets play a vital role in the electronics and renewable energy industries, enabling the deposition of thin films on diverse substrates. Let’s...Continue Reading
At present, high-purity sputtering target products are mainly used in the semiconductor industry and flat panel display industry. The market capacity and development trend of these fields are as follows. Semiconductor industry The high-purity sputtering target is rising with the development of the semiconductor industry, and integrated circuit industry has become one of the main...Continue Reading
Purity Purity is one of the main performance indexes of target materials because the purity of target materials has a great influence on the performance of thin films. However, the purity requirements of target materials are not the same in practical application. For example, with the rapid development of the microelectronics industry, the size of...Continue Reading
Semiconductor materials can be divided into wafer materials and packaging materials. Compared with wafer manufacturing materials, packaging materials have relatively low technical barriers, so we mainly talk about wafer manufacturing materials. The production of wafer mainly involves 7 kinds of semiconductor materials and chemicals, each of which accounts for the following proportion in the semiconductor...Continue Reading
Sputtering target is the key material for vacuum magnetron sputtering (PVD) coating. Working principle of target material: The target material is used as the cathode in the PVD system. The free electrons produced by the vacuum system impact the Ar molecule and form the Ar+ cation under the acceleration of the electric field, and the...Continue Reading
Titanium targets are widely used in decorative coatings, wear-resistant coatings, electronic industries such as CD, VCD, and all kinds of magnetic disk coating. Tungsten titanium (W-Ti) films and tungsten titanium (W-Ti) based alloy films are high-temperature alloy films, which possess a series of irreplaceable good properties. Tungsten has the high melting point, high strength, and...Continue Reading
A vacuum evaporation film, in an environment of no less than 10-2Pa vacuum, which is heated by resistance heating or electron beam and laser bombardment to heat the evaporated material to a fixed temperature so that the thermal vibration energy of the molecules or atoms in the material exceeds the binding energy of the surface,...Continue Reading
