Preparation It is very important to keep the vacuum chamber clean. Some residues formed during use will collect moisture and other pollutants, directly affecting the success rate of vacuum coating. Short-circuit or target arcing, film-forming surface roughness, and chemical impurities are often exceeded due to unclean sputtering chambers, sputter guns, and targets. In order to...Continue Reading
Common metal materials (such as low carbon steel, metal uranium, etc.) are very reactive and prone to corrosion and performance degradation. Therefore, people have been working on the research and preparation of anti-corrosion films for steel materials. Applying a relatively thin protective film on the surface of the metal material, such as aluminum, zinc, magnesium...Continue Reading
Target magnetic field The cathode operating voltage of magnetron sputtering decreases as the target surface magnetic field increases, and also decreases as the sputtering etch groove of the target surface deepens. The sputtering current increases as the sputter etch bath of the target surface deepens because the sputter etched surface of the target gets closer...Continue Reading
Introduction Ceramic is the general term for pottery and porcelain. The components of the ceramic material are mainly silicon oxide, aluminum oxide, potassium oxide, sodium oxide, calcium oxide, magnesium oxide, iron oxide, titanium oxide and etc. Common ceramic raw materials are clay, quartz, potassium sodium feldspar and etc. They generally have higher hardness but poor...Continue Reading
1. Preparation of Cu/In film by magnetron sputtering In order to accurately control the element ratio of Cu/In, CuIn film is prepared by the co-sputtering method. That is, the Cu/In alloy target and the In elemental target are simultaneously sputtered in the same sputtering chamber. The distribution of Cu/In content has a great influence on...Continue Reading
As is known, the ITO sputtering target is a black-gray ceramic semiconductor formed by a series of production processes after indium oxide and tin oxide powder are mixed in a certain proportion, and then sintered in a high-temperature atmosphere (1600 degrees, oxygen sintering). The ITO film was subjected to magnetron sputtering to oxidize the ITO target...Continue Reading
Sputter deposition rate is a parameter that characterizes the film formation rate. In addition to the influencing factors such as the type and pressure of the working gas, target type and area size of the “sputter etched area”, and target surface temperature and target surface magnetic field strength, the deposition rate is also directly affected...Continue Reading
PVD(Physical Vapor Deposition) coating, a physical terminology which is seemingly difficult to understand, actually is connected closely to our daily lives. Your beautiful jewelry, expensive camera and sharp knives may all use PVD coating. If you want to know more about PVD coating, just continue to read. What is PVD coating? PVD Coating, or...Continue Reading
Common targets and corresponding color 1. Golden Color Series Ti series: Ti TiN Ti+Au TiN+Au Ti+Zr TiZrN Other: Zr ZrN Zr+Au ZrN+Au Hf HfN 2.Black Color Series Ti series: Ti TiCN Ti (C, O) TiAl TiAlN Ti50Al50 black Ti30Al70 dark TiAl (C, O, N) Other: Si ...Continue Reading
